Molecular layer epitaxy method and compositions

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Reexamination Certificate

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C428S338000, C428S332000, 43, 43, 43, C117S084000, C117S099000

Reexamination Certificate

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06316098

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to molecular monolayer compositions and methods of forming the same.
REFERENCES
Anderson, H. L., et al.,
Angew. Chem. Int. Ed. Eng.
33:655 (1994).
Bird, R. B., et al., in T
RANSPORT
P
HENOMENA,
Wiley, New York, N.Y. (1960).
Braun, D., et al.,
Appl. Phys. Lett.
58:1982 (1991).
Braun, D., et al.,
J. Appl. Phys.
72:568 (1992).
Burn, P. L., et al.,
Nature
356:47 (1992).
Burroughes, J. H., et al.,
Nature
347:539 (1990).
Chemla, D. S., et al.,
IEEE J. Quantum Electron.
QE-20:265 (1984).
Donovan, K. J., et al.,
Thin Solid Films
232:110 (1993).
Donovan, K. J., et al.,
Thin Solid Films
244:923 (1994).
Forrest, S. R., et al.,
Phys. Rev.
B 49:11309 (1994).
Greenham, N. C., et al.,
Nature
365:628 (1993).
Gresho, P. M., et al., in R
ECENT
A
DVANCES IN
N
UMERICAL
M
ETHODS IN
F
LUIDS,
Vol. 1, Pineridge Press, p. 27 (1981).
Haskal, E. I., et al.,
Chem. Phys. Lett.
219:325 (1994).
Haskal, E. I., et al.,
Phys. Rev.
B51:4449 (1995).
Hiramoto, M., et al.,
Appl. Phys. Lett.
62:666 (1993).
Hong, H., et al.,
Appl. Phys.
79:3082 (1996).
Jenekhe, S. A., and Osaheni, J. A.,
Science
265:765 (1994).
Kido, J., et al.,
Appl. Phys. Lett.
63:2627 (1993).
Kido, J., et al.,
Appl. Phys. Lett.
64:815 (1994).
Kubono, A., et al.,
Prog. Polym. Sci.
19:389 (1994).
Lam, J. F., et al.,
Phys. Rev. Lett.
60:1614 (1991).
Li, D., et al., J.
Am. Chem. Soc.
112:7389 (1990).
Maruo, Y. Y., et al.,
J. Vac. Soc. Technol. A
11:2590 (1993).
Nalwa, H. S.,
Adv. Mater.
5:341 (1993).
Ohmori, Y., et al.,
Appl. Phys. Lett.
63:1871 (1993).
Osaheni, J. A., and Jenekhe, S. A.,
Macromolecules
27:739 (1994).
Pessa, M.,
Appl. Phys. Lett.
38:131 (1981).
Shirota, Y., et al.,
Appl. Phys. Lett.
64:807 (1994).
So, F. F., and Forrest, S. R.,
Phys. Rev. Lett.
60:2649 (1991).
So, F. F., et al.,
Phys. Rew. Lett.
66:2649 (1991).
So, F. F., et al.
SPIE
95:(b)(13) (1990a).
So, F. F., et al.,
Appl. Phys. Lett.
56:674 (1990b).
Takahashi, Y., et al.,
Macromolecules
24:3543 (1991).
Tanaka, K., et al.,
Synthetic Metals
65:81 (1994).
Tatsuura, S., et al.,
Appl. Phys. Lett.
60:1661 (1992).
Ulman, A., in A
N
I
NTRODUCTION TO
U
LTRATHIN
O
RGANIC
F
ILMS,
Academic Press, New York, N.Y., Part 3 (1991).
Wang, X.-S., et al.,
Jap. J. Appl. Phys.
32:2768 (1993).
Yitzchaik, S.,
J. Phys. Chem.
97:6958 (1993).
Yoshimura, T., et al.,
Appl. Phys. Lett.
59:482 (1991).
Yoshimura, T., et al.,
Appl. Phys. Lett.
247:829 (1992).
Zakhidov, A. A., and Yoshino, K.,
Synthetic Metals
64:155 (1994).
BACKGROUND OF THE INVENTION
The interest in two dimensional (2D) materials results from the fact that optoelectronics and molecular electronics have become frontier areas of material science (Ulman, 1991). Multilayered organic structures have recently received theoretical (Lam, et al., 1991) and experimental (So, et al., 1991; Forrest, et al., 1994; Haskal, et al., 1994; Ohmori, et al., 1993; Yoshimura, et al., 1991; Yoshimura, et al., 1992; Donovan, et al., 1993; Donovan, et al., 1994) treatment. Novel and applicable photophysical properties of organic superlattices have been predicted, including enhancement of optical nonlinearities (Lam, et al., 1991; Zakhidov and Yoshino, 1994) and photoelectric transformations (Zakhidov and Yoshino, 1994). Techniques such as organic molecular beam deposition (OMBD) (So, et al., 1991; Forrest, et al., 1994; Haskal, et al., 1994; Ohmori, et al., 1993) have already proved the capability of growing ultrathin layers having the quality of inorganic quantum well (QW) structures.
A number of interesting optical and photophysical phenomena have already been found in OMBD derived organic QW, including the observation of exciton confinement in photoluminescence (PL) (So, et al., 1991; Forrest, et al., 1994) and electroluminescence (EL) and electric field modulation of PL (Ohmori, et al., 1993). Preparation of crystalline thin organic films by the OMBD relies on the bonding of molecular layers via weak van der Waals forces to achieve and preserve quasi-epitaxial structures (Forrest, et al., 1994). Thus, perfect monolayers without step edges cannot be achieved and the lower limit is an average of three “monomolecular” layers. A solution to these limitations can be found in another ultrahigh vacuum (UHV) technique: molecular layer deposition (MLD) (Yoshimura, et al., 1991; Yoshimura, et al., 1992). MLD demonstrated the construction of quantum dots and quantum wires and the potential use of functionalized organic precursors to form alternating multilayered structures. This approach is similar to (inorganic) atomic layer deposition (ALD) (Pessa, et al., 1981) and the solution analog-molecular self-assembly (MSA) (Ulman, 1991). MLD is now at a stage that challenges chemists to introduce new and efficient optoelectronically-active molecular precursors to such a process.
A solution derived method to produce 2D layered structures, the Langmuir-Blodgett (LB) technique, yields films exhibiting anisotropic electron transport (Donovan, et al., 1994) and tunneling (Donovan, et al., 1993), again suggesting QW behavior. While the LB method is useful in achieving 2D multilayered physiadsorbed structures, LB films suffer from low chemical and thermal stability and cannot incorporate large chromophores without phase-segregation and micro-crystal formation. Alternatively, the trichlorosilane-based MSA approach 1 provides the advantages of strong chemiadsorption through Si—O bonds, chemical and thermal stability, and the ability to form noncentro symmetric structures (Yitzchaik, et al., 1993; Li, et al., 1990).
Vapor phase growth techniques (Kubono, et al., 1994) such as vapor deposition polymerization (VDP) of thin films was recently demonstrated for aromatic polymers such as polyimides (Maruo, et al., 1993), polyamides (Takahashi, et al., 1991), polyureas (Wang, et al., 1933), and polyether-amines (Tatsuura, et al., 1992). In the VDP process, two types of monomers are evaporated onto the surface of a substrate in a vacuum chamber. Condensation or addition polymerization then takes place between deposited monomers to produce thin polymeric films. Thin polymer films of high quality and uniformity can be fabricated by this process (Maruo, et al., 1993; Takahashi, et al., 1991). Thermally stable piezo- and pyro-electrical properties were found in poled samples (Wang, et al., 1993). Moreover, electric field assisted VDP (in situ poling of hyperpolarizable monomers) was employed to fabricate electro-optic polymer waveguides (Tatsuura, et al., 1992).
SUMMARY OF THE INVENTION
In one aspect, the invention includes a method of forming a polymer structure composed of two or more discrete monomolecular layers, where at least one layer is composed of molecules of a selected polycyclic aromatic compound having a defined z axis oriented substantially upright with respect to the plane of the monolayer, e.g., normal to the plane, or within about 30° of normal. The method includes depositing molecules of a selected aromatic compound, preferably a polycyclic aromatic compound, having a defined z axis with a chemically reactive group at each axial end, by vapor phase deposition, onto a substrate having surface-reactive sites capable of reacting with the chemically reactive group in the selected compound. The deposition step is carried under conditions which allow chemiadsorption of the selected compound in a molecular monolayer, by covalent coupling of one end of the compound to the substrate, and sublimation of non-covalently bonded compounds from the surface. There is formed by the deposition step a monomolecular layer of the selected compound characterized by in-plane compound ordering. These steps are one or more times, where the monomolecular layer formed at each deposition cycle forms a new substrate having a surface-exposed monolayer with exposed reactive groups.
In one general embodiment, the method includes reacting the surface-exposed monolayer with a bifunctional reagent that reacts with the exposed reactive groups forming the just-deposited layer, to

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