Molecular layer and method of forming the same

Coating processes – Electrical product produced

Reexamination Certificate

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C427S402000, C430S318000, C430S320000

Reexamination Certificate

active

10881150

ABSTRACT:
A molecular layer includes a Langmuir-Blodgett (LB) film of a molecule connected to a plurality of active device molecules, the molecule having a moiety with first and second connecting groups at opposed ends of the moiety. Each of the plurality of active device molecules includes a switching moiety, a self-assembling connecting group at one end of the switching moiety, and a linking group at an opposed end of the moiety. One or more defect site(s) exist between the plurality of active device molecules. A respective number of the first connecting groups of the LB film are connected to the plurality of active device molecules via at least some of the linking groups such that the LB film covers the plurality of active device molecules and the one or more defect site(s).

REFERENCES:
patent: 5556528 (1996-09-01), Bohn et al.
patent: 6124963 (2000-09-01), Schumaker
patent: 6128214 (2000-10-01), Kuekes et al.
patent: 6459095 (2002-10-01), Heath et al.
patent: 6674932 (2004-01-01), Zhang et al.
patent: 2002/0164419 (2002-11-01), Fukushima et al.
patent: 2002/0176276 (2002-11-01), Zhang et al.
patent: 0330395 (1989-08-01), None
Blinov, L.M., “Langmuir-Films”, Soviet Physics Uspekhi, American Institute of Physics, New York, US vol. 31, No. 7, Jul. 1, 1988, pp. 623-641.

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