Coating apparatus – Gas or vapor deposition
Patent
1999-01-29
2000-03-28
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
206710, 206711, 206454, 414217, 414291, 414935, 141 98, 141 85, 141383, B65B 104, B65D 8530, C23C 1600
Patent
active
060426519
ABSTRACT:
The system and method for molecular contamination control permits purging a SMIF pod to desired levels of relative humidity, oxygen, or particulates. The SMIF pod includes an inlet port including a check valve and filter assembly for supplying a clean, dry gaseous working fluid to maintain low levels of moisture, oxygen, and particulate content around materials contained in the SMIF pod. The SMIF pod outlet port, which also includes a check valve and filter assembly, is connected with an evacuation system. Flow of purge gas inside the SMIF pod can be directed with one or more nozzle towers to encourage laminar flow inside the pod, and one or more outlet towers, having a function similar to that of the inlet tower, may also be provided. The purge gas can be dried by exposure to a desiccant, heated to temperatures between about 100.degree. C. and about 120.degree. C., and can be tested for baseline constituent levels prior to or after introduction into a SMIF pod. Multiple SMIF pods can also be purged by a single contamination control base unit.
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International Serach Report Re PCT/US97/14969.
Comer Wayland
Eglinton Robert B.
Genco Robert M.
Mundt Gregory K.
Roberson, Jr. Glenn A.
Lund Jeffrie R
Semifab Incorporated
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