Molecular contamination control system

Coating apparatus – Gas or vapor deposition

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

206710, 206711, 206454, 414217, 414291, 414935, 141 98, 141 85, 141383, B65B 104, B65D 8530, C23C 1600

Patent

active

058794581

ABSTRACT:
The system and method for molecular contamination control permits purging a SMIF pod to desired levels of relative humidity, oxygen, or particulates. The SMIF pod includes an inlet port including a check valve and filter assembly for supplying a clean, dry gaseous working fluid to maintain low levels of moisture, oxygen, and particulate content around materials contained in the SMIF pod. The SMIF pod outlet port, which also includes a check valve and filter assembly, is connected with an evacuation system. Flow of purge gas inside the SMIF pod can be directed with one or more nozzle towers to encourage laminar flow inside the pod, and one or more outlet towers, having a function similar to that of the inlet tower, may also be provided. The purge gas can be dried by exposure to a desiccant, heated to temperatures between about 100.degree. C. and about 120.degree. C., and can be tested for baseline constituent levels prior to or after introduction into a SMIF pod. Multiple SMIF pods can also be purged by a single contamination control base unit.

REFERENCES:
patent: 4616683 (1986-10-01), Tullis et al.
patent: 4705444 (1987-11-01), Tullis et al.
patent: 4724874 (1988-02-01), Parikh et al.
patent: 4728389 (1988-03-01), Logar
patent: 4745088 (1988-05-01), Inoue et al.
patent: 4804086 (1989-02-01), Grohrock
patent: 4863561 (1989-09-01), Freeman et al.
patent: 4957781 (1990-09-01), Kanegae et al.
patent: 5032545 (1991-07-01), Doan et al.
patent: 5169272 (1992-12-01), Bonora et al.
patent: 5252133 (1993-10-01), Miyazaki et al.
patent: 5255783 (1993-10-01), Goodman et al.
patent: 5277579 (1994-01-01), Takanabe
patent: 5320218 (1994-06-01), Yamashita et al.
patent: 5354198 (1994-10-01), Yates
patent: 5373806 (1994-12-01), Logar
patent: 5433574 (1995-07-01), Kawano et al.
patent: 5469963 (1995-11-01), Bonora et al.
patent: 5482161 (1996-01-01), Williams et al.
patent: 5536320 (1996-07-01), Ushikawa et al.
patent: 5575081 (1996-11-01), Ludwig
patent: 5611452 (1997-03-01), Bonora et al.
patent: 5735961 (1998-04-01), Shimada
patent: 5740845 (1998-04-01), Bonora et al.
International Search Report RE PCT/US97/14969.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Molecular contamination control system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Molecular contamination control system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Molecular contamination control system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1316623

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.