Coating apparatus – Gas or vapor deposition – Work support
Patent
1989-03-27
1990-07-31
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118719, 118725, 118726, 156611, 156612, 156613, 156DIG103, 414217, 414222, C23C 1600
Patent
active
049442465
ABSTRACT:
A molecular beam epitaxy apparatus comprises a growth chamber provided therein with a holder support frame and connected via a first gate valve to a preparation chamber which in turn is connected to a loading chamber via a second gate valve. A first transfer tray arranged in the loading chamber receives a set of substrates from outside and advances into the preparation chamber. A second transfer tray supports a substrate holder in the preparation chamber to allow the set of substrates to be transferred from the first tray onto the holder by the aid of a substrate transfer assembly. The second tray is advanced into the growth chamber to transfer the loaded holder onto the holder support frame.
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Ishida Yuhji
Mushiage Masato
Tanaka Haruo
Bueker Richard
Eilberg William H.
Owens Terry J.
Rohm & Co., Ltd.
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