Mold gates and tape substrates including the mold gates

Active solid-state devices (e.g. – transistors – solid-state diode – Encapsulated

Reexamination Certificate

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Reexamination Certificate

active

11186714

ABSTRACT:
A mold gate of a tape substrate includes an aperture formed in the flexible dielectric film of the tape substrate and a support element which is carried by a surface of the flexible dielectric film. The aperture of the mold gate may be formed by die cutting or etching processes. The support element of the mold gate is substantially coplanar with conductive traces carried by the flexible dielectric film, and may be formed from the same material as the conductive traces. The support element of the mold gate may be fabricated by patterning a conductive film and formed at substantially the same time as the conductive traces of the tape substrate are formed. Packaging methods and degating methods that include use of the tape substrate are also disclosed.

REFERENCES:
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patent: 5750421 (1998-05-01), Kasai et al.
patent: 5981873 (1999-11-01), Heo
patent: 5982625 (1999-11-01), Chen et al.
patent: 6329606 (2001-12-01), Freyman et al.
patent: 2002/0180010 (2002-12-01), Tsubosaki et al.
patent: 2004/0164411 (2004-08-01), Shin et al.
patent: 0 961 317 (1999-12-01), None
Patent Abstracts of Japan, JP 03-106046, Mitsubishi Electric Corp., May 2, 1991.
Search Report, Mar. 9, 2005, 6 pages.
Patent Abstracts of Japan, JP 03-106045 A, Mitsubishi Electric Corp., May 2, 1991.
Patent Abstracts of Japan, JP 05-211186 A, NEC Corp., Aug. 20, 1993.
Patent Abstracts of Japan, JP 06-151515 A, NEC Corp, May 31, 1994.

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