Moisturizing nail polish composition

Details Moisturizing nail polish composition Moisturizing nail polish composition

1982-04-19

1983-09-06

Phillips, Delbert R.

Drug, bio-affecting and body treating compositions

Manicure or pedicure compositions

A61K 704

Patent

active

044029357

ABSTRACT:
An improved nail polish composition for application to human nails which allows a polished nail to retain and absorb moisture thereby preventing brittleness and breakage of polished nails. Water and urea are used in the composition to impart moisture to the polished nail and polyvinyl butyral resin is used to harden the nail polish composition which is softened by the addition of water and to increase the adhesion of the nail polish composition to the nail.

REFERENCES:
patent: 3422185 (1969-01-01), Kuritzkes
patent: 4126144 (1978-11-01), Duarte
patent: 4283324 (1981-08-01), Duffy
Balsam et al., Cosmetic Science and Technology, N.Y., Wiley Interscience, vol. II, 1972, pp. 521-530.
Gregory, Uses and Applications of Chemicals and Related Materials, N.Y., Reinhold Publishing Corporation, 1939, p. 630.

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