Moisture measuring device for high temperature gas

Details Moisture measuring device for high temperature gas Moisture measuring device for high temperature gas

1987-09-24

1989-07-25

Kaplan, G. L.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204 1T, 204410, 204412, 204425, G01N 2758

Patent

active

048511030

ABSTRACT:
A moisture (H.sub.2 O) measuring device for high temperature gas deriving the moisture content by taking a difference between measured values of oxygen concentration by an operational process. The one value of the an oxygen concentration is for oxygen content originally included in the measuring gas and the other value of the oxygen concentration is one additionally including oxygen content obtained by electrolysis of the moisture in the measuring gas. The two measured values are controlled by applying voltage for the oxygen pump.

REFERENCES:
patent: 4264425 (1981-04-01), Kimura et al.
patent: 4576705 (1986-03-01), Kondo et al.

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