Moisture management system

Details Moisture management system Moisture management system

2007-01-30

2007-01-30

Morris, Terrel (Department: 1771)

Fabric (woven, knitted, or nonwoven textile or cloth, etc.)

Woven fabric

Woven fabric including an additional woven fabric layer

C442S205000, C442S079000, C428S357000, C428S109000, C428S131000, C428S163000, C428S172000, C428S181000, C428S183000, C604S378000, C604S384000

Reexamination Certificate

active

10680757

ABSTRACT:
A three dimensional fabric suitable for use as a moisture management system for footwear and apparel which includes a first surface and a second surface which encase a center section. At least one surface is water repellent and may include pores of a predetermined size to allow moisture to pass therethrough. The fabric further contains a moisture absorbing agent which functions to capture and hold moisture which is later evaporated within a predetermined time period.

REFERENCES:
patent: 2869253 (1959-01-01), Sachs
patent: 3627567 (1971-12-01), Tensho
patent: 4430811 (1984-02-01), Okada
patent: 4465730 (1984-08-01), Okada
patent: 4530873 (1985-07-01), Okada
patent: 4645698 (1987-02-01), Matsubara
patent: 5141794 (1992-08-01), Arroyo
patent: 5217782 (1993-06-01), Moretz et al.
patent: 5290269 (1994-03-01), Heiman
patent: 5291617 (1994-03-01), Moretz et al.
patent: 5306536 (1994-04-01), Moretz et al.
patent: 5331059 (1994-07-01), Engelhardt et al.
patent: 5364678 (1994-11-01), Lumb et al.
patent: 5365677 (1994-11-01), Dalhgren
patent: 5378529 (1995-01-01), Bourdeau
patent: 5511323 (1996-04-01), Dahlgren
patent: 5614302 (1997-03-01), Nance, Jr.
patent: 5693707 (1997-12-01), Cheng et al.
patent: 5738937 (1998-04-01), Baychar
patent: 5746013 (1998-05-01), Fay, Sr.
patent: 5763335 (1998-06-01), Hermann
patent: 5896758 (1999-04-01), Rock et al.
patent: 6048810 (2000-04-01), Baychar
patent: 6156406 (2000-12-01), Rock et al.
patent: 6235659 (2001-05-01), McAmish et al.
patent: 6289841 (2001-09-01), Caldwell
patent: 6380298 (2002-04-01), Flautt et al.
patent: 6395957 (2002-05-01), Chen et al.
patent: 6410465 (2002-06-01), Lim et al.
patent: 6432504 (2002-08-01), Yeh
patent: 6464672 (2002-10-01), Buckley
patent: 6476104 (2002-11-01), Nakamura et al.
patent: 6479144 (2002-11-01), Petrea et al.
patent: 6533885 (2003-03-01), Davis et al.
patent: 6558784 (2003-05-01), Norton et al.
patent: 2001/0009830 (2001-07-01), Baychar
patent: 2001/0024716 (2001-09-01), Chen et al.
patent: 2001/0053643 (2001-12-01), McAmish et al.
patent: 2002/0025749 (2002-02-01), Shimizu et al.
patent: 2002/0094740 (2002-07-01), Li et al.
patent: 2002/0098761 (2002-07-01), Nishimoto et al.
patent: 2002/0103469 (2002-08-01), Chen et al.
patent: 2002/0107795 (2002-08-01), Chen et al.
patent: 2002/0119907 (2002-08-01), Baker et al.
patent: 2002/0128420 (2002-09-01), Simpson et al.
patent: 2002/0141898 (2002-10-01), Carlucci et al.
patent: 2002/0143305 (2002-10-01), Yang et al.
patent: 2002/0147435 (2002-10-01), Coles et al.
patent: 2002/0164474 (2002-11-01), Buckley
patent: 2002/0197396 (2002-12-01), Haggquist
patent: 2003/0026945 (2003-02-01), Lasko
patent: 2003/0149413 (2003-08-01), Mehawej
patent: 2003/0149414 (2003-08-01), Mehawej
patent: 00/61642 (2000-10-01), None

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