Patent
1985-06-27
1987-03-24
Carroll, J.
357 16, 357 55, H01L 2980
Patent
active
046528962
ABSTRACT:
To realize a depletion-mode modulation-doped field-effect transistor with high gate-length to depletion-depth ratio that is capable of providing high power gain at millimeter-wave frequencies, an ohmic gate or a heterojunction gate is used on the n-AlGaAs/GaAs layered structure, replacing the prior art Shottky-barrier metal gate. The depletion-mode operation is desirable for analog signal amplifying circuits as opposed to the enhancement-mode device commonly used for switching or digital circuits. In the case of Schottky-barrier gate, high aspect ratio structures naturally operate in the enhancement mode, hence the need for the change in the gate electrode structure.
REFERENCES:
patent: 4157556 (1979-06-01), Decket et al.
patent: 4186410 (1980-01-01), Cho et al.
patent: 4194935 (1980-03-01), Dingle et al.
patent: 4333100 (1982-06-01), Morcom et al.
patent: 4424525 (1984-01-01), Mimura
patent: 4455564 (1984-06-01), Delagebeaudeuf et al.
patent: 4492974 (1985-01-01), Yoshida et al.
patent: 4494016 (1985-01-01), Ransom et al.
patent: 4558337 (1985-12-01), Saunier et al.
patent: 4559547 (1985-12-01), Shiraki et al.
Ogura et al, "Self-Aligned Enhancement Mode FET with AlGaAs Gate Insulator", J. Vac. Sci. Technol. B 3(2) Mar./Apr. 1985, pp. 581-583.
Judaprawira, "Modulation-Doped MBE GaAs/N-Al.sub.x Ga1-x As MESFETs", IEEE Electron Device Letters, vol. EDL-2, No. 1, Jan. 1981, pp. 14-15.
Kopp et al, "Characteristics of Submicron Gate GaAs FET's with Al.sub.0.3 Ga.sub.0.7 As Buffers: Effects of Interface Quality", IEEE Electron Device Letters, vol. EDL-3, No. 2, Feb. 1982, pp. 46-48.
Hiyamizu, et al, "MBE-Grown GaAs/N-AlGaAs Heterostructures and their Application to High Electron Mobility Transistors", Jap. Jour. of Appl. Physics, vol. 21, 1982, Supp. 21-1, pp. 161-168.
Umebachi et al, "A New Heterojunction Gate GaAs FET", IEEE Transactions on Electron Devices, Aug. 1975, pp. 613-614.
Paul M. Solomon and Hadis Morkoc, "Modulation Doped GaAs/AlGaAs Heterojunction Field-Effect Transistors (MODFET's), Ultrahigh-Speed Device for Supercomputers" IEEE Transactions on Electron Devices, vol. ED-31, No. 8, Aug. 84, 1015-1027.
Makunda B. Das, "A High Aspect Ratio Design Approach to Millimeter-Wave HEMT Structures", IEEE Transactions on Electron Devices, vol. ED-32, No. 1, Jan. 85, 11-17.
Das Mukunda B.
Grzyb Joseph A.
Norris George B.
Carroll J.
Franz Bernard E.
Mintel William A.
Singer Donald J.
The United States of America as represented by the Secretary of
LandOfFree
Modulation doped GaAs/AlGaAs field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Modulation doped GaAs/AlGaAs field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modulation doped GaAs/AlGaAs field effect transistor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1356889