Modulated lithographic beam to reduce sensitivity to...

Details Modulated lithographic beam to reduce sensitivity to... Modulated lithographic beam to reduce sensitivity to...

2006-03-21

2006-03-21

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

07016013

ABSTRACT:
A lithographic apparatus capable of reducing sensitivity to fluctuating scanning speed and improve lithographic scanning processing time, is presented herein. In one embodiment, the apparatus comprises a modulator that modulates a patterned lithographic beam based on the scanning speed as the beam and substrate move relative to each other. The modulator is configured to modulate an attribute of a patterned lithographic beam, such as, the intensity or size of the beam.

REFERENCES:
patent: 2003/0035090 (2003-02-01), Imai et al.
patent: 2003/0197849 (2003-10-01), Ishikawa et al.

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