Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1989-01-06
1991-12-31
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Multizone chamber
118715, 118723, 156345, 34 91, 20429825, 20429835, 414217, 414401, 414416, C23C 1600
Patent
active
050762052
ABSTRACT:
A system for multichamber processing of semiconductor wafers providing flexibility in the nature of processing available in a multi processing facility. To accommodate changing processing demands and chamber replacement, a mobile processing chamber selectively docks with a multiple chamber system to form one of its processing chambers. The capabilities of the multiprocessing multichamber system are enhanced by extending the system to other multichamber systems through intermediate buffer storage wafer cassette and elevator systems. The extending multichamber system is further provided with intermediate access wafer storage elevator cassettes.
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Maher Joseph A.
Napoli Joseph D.
Vowles E. John
Beck Shrive
General Signal Corporation
Owens Terry J.
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