Modular vapor processor system

Coating apparatus – Gas or vapor deposition – Multizone chamber

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Details

118715, 118723, 156345, 34 91, 20429825, 20429835, 414217, 414401, 414416, C23C 1600

Patent

active

050762052

ABSTRACT:
A system for multichamber processing of semiconductor wafers providing flexibility in the nature of processing available in a multi processing facility. To accommodate changing processing demands and chamber replacement, a mobile processing chamber selectively docks with a multiple chamber system to form one of its processing chambers. The capabilities of the multiprocessing multichamber system are enhanced by extending the system to other multichamber systems through intermediate buffer storage wafer cassette and elevator systems. The extending multichamber system is further provided with intermediate access wafer storage elevator cassettes.

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