Coating apparatus – Gas or vapor deposition
Patent
1986-05-19
1988-02-02
Bueker, Richard R.
Coating apparatus
Gas or vapor deposition
414217, 414222, 414287, C23C 1400
Patent
active
047222980
ABSTRACT:
A self-contained modular processing apparatus is disclosed for processing workpieces, and in particular, silicon wafers. The apparatus is constructed of framed modules which plug into a service facility docking subassembly and interlock therewith to make up a complete modular processing system for wafer processing. Each module may be provided with its own wafer transporting mechanism and includes a built-in CPU such that each module is an independent, stand-alone processing unit. Each processing unit, by being capable of independent operation, functions as a building block to configure a modular processing system capable of handling wafer flow in multiple directions while performing a multitude of processing functions or operations. Individual modules are arranged along a line of single fold symmetry such that a single transport mechanism may be employed for transferring wafers among adjacent modules.
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Heim Richard C.
Pawenski Scott M.
Petrone Benjamin J.
Rubin Richard H.
Bueker Richard R.
Machine Technology, Inc.
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