Coating apparatus – Gas or vapor deposition
Patent
1987-09-01
1989-08-01
Childs, Richard
Coating apparatus
Gas or vapor deposition
118719, 134 61, 134201, 219385, 219393, 219482, C23C 1400
Patent
active
048525162
ABSTRACT:
A self-contained modular processing apparatus is disclosed for processing workpieces, and in particular, silicon wafers. The apparatus is constructed of framed modules which plug into a service facility docking subassembly and interlock therewith to make up a complete modular processing system for wafer processing. Each module may be provided with its own wafer transporting mechanism and includes a built-in CPU such that each module is an independent, stand-alone processing unit. Each processing unit, by being capable of independent operation, functions as a building block to configure a modular processing system capable of handling wafer flow in multiple directions while performing a multitude of processing functions or operations. Individual modules are arranged along a line of single fold symmetry such that a single transport mechanism may be employed for transferring wafers among adjacent modules.
REFERENCES:
patent: 4048955 (1977-09-01), Anderson
patent: 4433951 (1984-02-01), Koch
patent: 4592306 (1986-06-01), Gallego
patent: 4681773 (1987-07-01), Bean
Heim Richard C.
Pawenski Scott M.
Petrone Benjamin J.
Rubin Richard H.
Childs Richard
Machine Technology, Inc.
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