Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...
Patent
1993-08-27
1995-07-25
Acquah, Samuel A.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Post imaging process, finishing, or perfecting composition...
528 87, 528103, 528112, 528176, 528185, 528272, 528296, 528298, 528301, 528302, 528303, 528306, 528307, 5283086, G03G 900, C08G 5900
Patent
active
054361036
ABSTRACT:
Modified unsaturated linear polymers have at least a first residue, a second residue and an acid residue. The first, second and acid residues correspond to a first, second and acid monomers used to prepare the polymers. The first monomer may be a diacid, anhydride, diacid ester or mixture thereof. The second monomer may be a diol or glycol. The acid monomer may be an aromatic dicarboxylic acid, different than the first monomer. The first residue is present in a concentration not less than about 7.5 mole % and the acid residue is present in a concentration ranging between 2.5 mole % and 12.5 mole %, based on the total mole monomer ratio of the polymer. The polymers have a glass transition temperature ranging from about 54.degree. C. to about 64.degree. C.
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Bayley Robert D.
Fox Carol A.
Hoffend Thomas R.
Paxson James R.
Acquah Samuel A.
Palazzo Eugene O.
Xerox Corporation
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