Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2005-04-15
2008-12-09
Cleveland, Michael (Department: 1792)
Coating apparatus
Gas or vapor deposition
Work support
C118S715000, C156S917000
Reexamination Certificate
active
07462246
ABSTRACT:
A susceptor for supporting wafers during an chemical vapor deposition process. The susceptor has recesses and orifices disposed in the recesses extending to a central passage of the susceptor. The susceptor has exhaust openings disposed in the top of the susceptor to allow gas from the central passage of the susceptor to exit out the openings. A baffle plate covers the exhaust openings and a vertical space is created between the baffle plate and the top of the susceptor to allow gas to exit from the central passage to outside the susceptor. The bottom of the susceptor also has exhaust openings disposed therein. These openings allow gas from the central passage to exit the susceptor.
REFERENCES:
patent: 4612207 (1986-09-01), Jansen
patent: 4823736 (1989-04-01), Post et al.
patent: 4990374 (1991-02-01), Keeley et al.
patent: 5033538 (1991-07-01), Wagner et al.
patent: 5051054 (1991-09-01), Wagner et al.
patent: 5177878 (1993-01-01), Visser
patent: 5180000 (1993-01-01), Wagner et al.
patent: 5769942 (1998-06-01), Maeda
patent: 5843234 (1998-12-01), Finn et al.
patent: 5904769 (1999-05-01), Ohashi et al.
patent: 6129047 (2000-10-01), Nakamura
patent: 6129048 (2000-10-01), Sullivan
patent: 6262397 (2001-07-01), Yazawa
patent: 6444027 (2002-09-01), Yang et al.
patent: 6596095 (2003-07-01), Ries et al.
patent: 6652650 (2003-11-01), Yang et al.
patent: 2005/0000449 (2005-01-01), Ishibashi et al.
patent: 63-58819 (1988-03-01), None
patent: 08-8198 (1996-01-01), None
patent: 10-223545 (1998-08-01), None
patent: 11-087250 (1999-03-01), None
patent: WO 90/13687 (1990-11-01), None
patent: WO 03/060967 (2003-07-01), None
Armstrong Teasdale LLP
Chen Keath T
Cleveland Michael
MEMC Electronic Materials , Inc.
LandOfFree
Modified susceptor for barrel reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Modified susceptor for barrel reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modified susceptor for barrel reactor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4049601