Modified reaction chamber and improved gas flushing method in ra

Details Modified reaction chamber and improved gas flushing method in ra Modified reaction chamber and improved gas flushing method in ra

1995-02-13

1996-12-03

Picardat, Kevin M.

Fishing, trapping, and vermin destroying

437248, 219390, H01L 71324

Patent

active

055808301

ABSTRACT:
A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reaction chamber. A method of flushing the reaction chamber, using a short time laminar flow of the flush gas, is used in combination with the aperture to increase the throughput of the RTP system.

REFERENCES:
patent: 4573431 (1986-03-01), Sarkozy
patent: 5001327 (1991-03-01), Hirasawa et al.
patent: 5228206 (1993-07-01), Grant et al.
patent: 5259883 (1993-11-01), Yamabe et al.
patent: 5433368 (1995-07-01), Spigarelli
patent: 5434090 (1995-07-01), Chiou et al.

Affiliated with

Also associated with

Rating

Modified reaction chamber and improved gas flushing method in ra does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Modified reaction chamber and improved gas flushing method in ra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modified reaction chamber and improved gas flushing method in ra will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-785423