Modified processing of positive photoresists

Details Modified processing of positive photoresists Modified processing of positive photoresists

1975-12-10

1977-02-08

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 362, 96 49, 96 75, 96 91D, G03F 708, G03C 500

Patent

active

040070476

ABSTRACT:
Positive photoresist layers including a base soluble resin and a diazo ketone sensitizer are treated with hydrogen ion following initial exposure to achieve changes in the developed resist profile and/or development in a negative mode.

REFERENCES:
patent: 2958599 (1960-11-01), Neugebauer
patent: 2994609 (1961-08-01), Landau
patent: 3046118 (1962-07-01), Schmidt
patent: 3046121 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3126281 (1964-03-01), Sus et al.
patent: 3173788 (1965-03-01), Wimmer et al.
patent: 3201239 (1965-08-01), Neugebauer et al.
patent: 3264104 (1966-08-01), Reichel
patent: 3406065 (1968-10-01), Uhlig
patent: 3522044 (1970-07-01), Hackmann
patent: 3533796 (1970-10-01), Lassig et al.
patent: 3592646 (1971-07-01), Holstead et al.
patent: 3637644 (1972-01-01), Dunham et al.
patent: 3779778 (1973-12-01), Smith et al.
Arcus et al., IBM Tech. Discl. Bulletin, vol. 15, No. 11, Apr. 1973, p. 3537.
Dinaburg, M. S., "Photosensitive Diazo Compounds," The Focal Press, 1964, pp. 31-46, and 181-196.
Chem. Abstracts, (I), vol. 60, No. 651h, 1964.
Chem. Abstracts, (II), vol. 69, No. 35074(d), 1968.
Gould, Edwin S., "Mechanism and Structure in Organic Chemistry," Holt et al., N.Y.C., 1959, pp. 346-353.

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