Modified photolithography movement system

Details Modified photolithography movement system Modified photolithography movement system

2007-01-16

2007-01-16

Cabrera, Zoila (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S117000, C359S223100

Reexamination Certificate

active

10064156

ABSTRACT:
A method and system is provided for moving a substrate relative to a pixel panel in a digital photolithography system. The method can be used for performing photolithography on a substrate, the substrate having a first portion with a first design resolution and a second portion with a second design resolution. The method includes scanning the first portion of the substrate, having the first design resolution, at a first speed and scanning the second portion of the substrate, having the second design resolution, at a second speed, different from the first.

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