Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-03-03
1991-03-12
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2141824, B01D 6148
Patent
active
049990985
ABSTRACT:
A suppressor for use in ion chromatography including at least an effluent flow channel separated by a charged membrane from a suppressor flow channel. A screen of the same charge as the membrane is placed in at least the effluent flow channel. Preferably, a similar screen is placed in the regenerant flow channel. The screen increases the dynamic capacity of the membrane suppressor.
REFERENCES:
patent: 2502614 (1950-04-01), Zender
patent: 2784158 (1957-03-01), Bodamer et al.
patent: 2799644 (1957-07-01), Kollsman
patent: 3046211 (1962-07-01), Tye
patent: 3496091 (1970-02-01), McGriff et al.
patent: 3761386 (1973-09-01), Smith
patent: 3896015 (1975-07-01), McRae
patent: 4265634 (1981-05-01), Pohl
patent: 4303493 (1981-12-01), Kneifel et al.
patent: 4337141 (1982-06-01), Watanabe et al.
patent: 4403039 (1983-09-01), Ban et al.
patent: 4455233 (1984-06-01), Pohl et al.
patent: 4465573 (1984-08-01), O'Hare
patent: 4529521 (1985-07-01), Cortes et al.
patent: 4533518 (1985-08-01), Hanaoka et al.
Desalination, 19 (1976) 465-470, Elsevier Scientific Publishing Amsterdam, The Netherlands.
Gajek Ryszard
Pohl Christopher
Slingsby Roseanne W.
Stillian John R.
Dionex Corporation
Niebling John F.
Starsiak Jr. John S.
LandOfFree
Modified membrane suppressor and method for use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Modified membrane suppressor and method for use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modified membrane suppressor and method for use will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-447156