Modified close fraction batch process for purification of SiO.su

Details Modified close fraction batch process for purification of SiO.su Modified close fraction batch process for purification of SiO.su

1985-10-21

1989-04-04

Stoll, Robert L.

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423340, C07B 3312

Patent

active

048185108

ABSTRACT:
The disclosed process separates impurities, including admixed minerals other than quartz and quartz particles having relatively high levels of lattice impurities, from a quartz containing particulate material to recover a high purity quartz product. The process involves treatment with a solvent to reduce the size of the impurities relative to the quartz product and the thus treated material is then classified by size to recover the purified product. If impurities less soluble than the quartz product are also present, a second solvent treatment is conducted to reduce the size of the quartz particles relative to the less soluble impurity and a second classification by size is conducted. In a preferred embodiment, the quartz is subjected to a heat/quench cycle to fracture quartz particles thereby exposing occluded and interstitial impurities to the solvent leach. The intermediate product exiting the final solvent treatment and classification steps is dried, blended and roasted in a vacuum to remove gases.

REFERENCES:
patent: 3837826 (1974-09-01), Sawyer
patent: 3961030 (1976-06-01), Wiewiorowski et al.
patent: 4067953 (1978-01-01), Roux et al.
patent: 4225422 (1980-09-01), Trevoy et al.
patent: 4542003 (1985-09-01), Watkins et al.

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