Modified chemical vapor deposition using independently controlle

Details Modified chemical vapor deposition using independently controlle Modified chemical vapor deposition using independently controlle

1998-06-05

2000-11-14

Meeks, Timothy

Glass manufacturing

Processes of manufacturing fibers, filaments, or preforms

Process of manufacturing optical fibers, waveguides, or...

65417, 65423, 65430, 4271632, 427166, 42725535, 42725537, 42725539, C23C 1640

Patent

active

061453455

ABSTRACT:
The deposition rate of MCVD processes is enhanced by applying at least a first and a second independently controlled heat source to a plurality of reactants which are used to form deposited particulate matter. The first heat source is adjusted so as to provide at least a specified rate of reaction for the reactants, and the second source is adjusted so as to provide at least a specified deposition rate for the particulate matter.

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patent: B14334903 (1986-07-01), MacChesney et al.

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