Modified chemical vapor deposition of an optical fiber using an

Details Modified chemical vapor deposition of an optical fiber using an Modified chemical vapor deposition of an optical fiber using an

1980-03-07

1981-04-14

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 427 47, 427237, 427238, 4273762, B05D 306

Patent

active

042620350

ABSTRACT:
The modified chemical vapor deposition process is practiced using an rf source as the external heat source. An rf plasma is thus established within a glass tube through which appropriate glass precursor vapors are passed. As a result of the ensuing chemical reactions, particulate material is formed within the tube and deposits on it. The hot plasma zone may be used to consolidate this particulate material into a transparent glass, and onto the interior wall of the tube. The tube is subsequently drawn into an optical fiber.

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