Modification of mask layout data to improve writeability of OPC

Static information storage and retrieval – Information masking

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430 5, 430 30, G11C 1300

Patent

active

060440074

ABSTRACT:
A data storage medium contains mask layout data for use in writing a mask includes a first mask data portion which corresponds to a feature having an interior corner. The first mask data portion corresponding to the interior corner includes a multi-level or stepped inner serif in the interior corner which provides for improved writeability of OPC independent of process push or bias. Alternatively, the data storage medium contains mask layout data which includes a second mask data portion. The second mask data portion corresponds to a feature having an exterior corner and includes a multi-level or stepped outer serif on the exterior corner. The stepped outer serif also provides for improved writeability of OPC independent of process push or bias.

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patent: 5998070 (1999-12-01), Lee

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