Electric heating – Heating devices – With power supply and voltage or current regulation or...
Patent
1997-01-27
1999-04-20
Paschall, Mark
Electric heating
Heating devices
With power supply and voltage or current regulation or...
219483, 219486, 118725, 364477, 392416, H05B 102
Patent
active
058955968
ABSTRACT:
Controllers and associated methods for controlling a thermal reactor or other thermal semiconductor processors which include a heating element powered by a power source, and having profile thermocouples and spike thermocouples. One preferred method comprises the following steps: modeling thermal dynamic characteristics of the thermal reactor, the modeling step including providing thermocouple instrumented wafers in the thermal reactor, perturbing the thermal reactor by controlling the heating element using a stimulation sequence, and developing models based on changes in temperature created by the perturbations. The models are developed off-line and can include one or more models, such as a model of power versus spike thermocouple readings, a model of spike thermocouple readings versus profile thermocouple readings, and a model of profile thermocouple readings versus thermocouple instrumented wafer readings. On-line models are further derived and used during operation to control power input to the zones of the thermal processor using measured profile and spike temperatures. The models can be cascaded or selectively activated to achieve different control regimes.
REFERENCES:
patent: 4276603 (1981-06-01), Beck et al.
patent: 4688180 (1987-08-01), Motomiya
patent: 4711989 (1987-12-01), Yu
patent: 4761538 (1988-08-01), Chiba et al.
patent: 4937434 (1990-06-01), Nakao
patent: 5099442 (1992-03-01), Furuta et al.
patent: 5258601 (1993-11-01), Takano
patent: 5280422 (1994-01-01), Moe et al.
patent: 5291514 (1994-03-01), Heitmann et al.
patent: 5517594 (1996-05-01), Shah et al.
B. J. Van Schravendijk et al., "Modeling and control of the wafer temperatures in a diffusion furnace", Journal of Applied Physics, Feb. 15, 1987, pp. 1620-1627.
"Control of MMST RTP: Repeatability, Uniformity, and Integration for Flexible Manufacturing", by Charles Schaper et al., IEEE Transactions on Semiconductor Manufacturing, pp. 1-24 and drawings.
"Adaptive Temperature Control of Industrial Diffusion/LPCVD Reactors", by H. De Waard & W.K. De Koning, IFAC Intelligent Tuning and Adaptive Control, Singapore, 1991.
T.A. Badgwell et al., "In situ measurement of wafer temperature in a low pressure chemical vapor deposition furnace", American Institute of Physics, pp. 1129-1133.
"Modeling, Identification, and Control of Rapid Thermal Processing Systems", by Charles Schaper et al., Journal of the Electrochemical Society, Sep. 1993, pp. 1-29 and drawings.
"Temperature Distribution in Semiconductor Wafers Heated in a Vertical Diffusion Furnace", by Shigeki Hirasawa et al., IEEE Transactions on Semiconductor Manufacturing, Aug. 1993, pp. 226-232.
"Optimization of Transient Temperature Uniformity in RTP Systems", by Stephen Norman, IEEE Transactions on Electron Devices, Jan. 1992, pp. 205-207.
"Frequency Shaping", Chapter 9, pp. 262-289.
"Optimization Problems for Dynamic Systems", Chapter 2, pp. 42-89. "Optimization Problems for Dynamic Systems with Path Constraints", Chapter 3, pp. 90-127.
"Model Identification in Rapid Thermal Processing Systems", by Young Man Cho & Thomas Kailath--IEEE Transactions on Semiconductor Manufacturing, Aug. 1993, pp. 233-245.
"Optimal Control of the Wafer Temperatures in Diffusion/LPCVD Reactors", by H. De Waard and W.L. De Koning, pp. 243-252, 1992--International Federation of Automatic Control.
Chapter 8, "System Identification", pp. 349-416. Chapter 9, "Multivariable and Optimal Control", pp. 417-483.
"Appendix 4A: Identifiability of Black-Box Multivariable Model Structures", Models of Linear Time-Invariant Systems, pp. 114-126.
Hugues Jean Benoit
Stoddard Kevin
Tsakalis Konstantinos
Paschall Mark
Semitool Thermal
LandOfFree
Model based temperature controller for semiconductor thermal pro does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Model based temperature controller for semiconductor thermal pro, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Model based temperature controller for semiconductor thermal pro will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2246101