Moat system for an imprint lithography template

Details Moat system for an imprint lithography template Moat system for an imprint lithography template

2007-12-18

2007-12-18

Mackey, James P. (Department: 1722)

Plastic article or earthenware shaping or treating: apparatus

With means to gather excess or rejected stock material

C425S470000, C425S810000, C425S385000, C264S001360

Reexamination Certificate

active

10917761

ABSTRACT:
The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent, a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks.

REFERENCES:
patent: 3677178 (1972-07-01), Gipe
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4512848 (1985-04-01), Deckman et al.
patent: 4722878 (1988-02-01), Watakabe et al.
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4959252 (1990-09-01), Bonnebat et al.
patent: 5028366 (1991-07-01), Harakal et al.
patent: 5206983 (1993-05-01), Guckel et al.
patent: 5259926 (1993-11-01), Kuwabara et al.
patent: 5348616 (1994-09-01), Hartman et al.
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5477058 (1995-12-01), Sato
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5545367 (1996-08-01), Bae et al.
patent: 5601641 (1997-02-01), Stephens
patent: 5669303 (1997-09-01), Maracas et al.
patent: 5772905 (1998-06-01), Chou
patent: 5776748 (1998-07-01), Singhvi et al.
patent: 5817376 (1998-10-01), Everaerts et al.
patent: 5820769 (1998-10-01), Chou
patent: 5849209 (1998-12-01), Kindt-Larsen et al.
patent: 5849222 (1998-12-01), Jen et al.
patent: 5853446 (1998-12-01), Carre et al.
patent: 5937758 (1999-08-01), Maracas et al.
patent: 5948470 (1999-09-01), Harrison et al.
patent: 5952127 (1999-09-01), Yamanaka
patent: 5956216 (1999-09-01), Chou
patent: 6051345 (2000-04-01), Huang
patent: 6117708 (2000-09-01), Wensel
patent: 6165911 (2000-12-01), Calveley
patent: 6190929 (2001-02-01), Wang et al.
patent: 6218316 (2001-04-01), Marsh
patent: 6251207 (2001-06-01), Schultz et al.
patent: 6261469 (2001-07-01), Zakhidov et al.
patent: 6309580 (2001-10-01), Chou
patent: 6316290 (2001-11-01), Wensel
patent: 6334960 (2002-01-01), Willson et al.
patent: 6355198 (2002-03-01), Kim et al.
patent: 6387787 (2002-05-01), Mancini et al.
patent: 6391217 (2002-05-01), Schaffer et al.
patent: 6482742 (2002-11-01), Chou
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6517995 (2003-02-01), Jacobson et al.
patent: 6518189 (2003-02-01), Chou
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6664026 (2003-12-01), Nguyen et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6713238 (2004-03-01), Chou et al.
patent: 6716754 (2004-04-01), Hofmann et al.
patent: 6743368 (2004-06-01), Lee
patent: 6753131 (2004-06-01), Rogers et al.
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6809356 (2004-10-01), Chou
patent: 6828244 (2004-12-01), Chou
patent: 6849558 (2005-02-01), Schaper
patent: 6890688 (2005-05-01), Mancini et al.
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6908861 (2005-06-01), Sreenivasan et al.
patent: 6916584 (2005-07-01), Sreenivasan et al.
patent: 6932934 (2005-08-01), Choi et al.
patent: 7136150 (2006-11-01), Sreenivasan et al.
patent: 7179079 (2007-02-01), Sreenivasan et al.
patent: 2002/0042027 (2002-04-01), Chou et al.
patent: 2002/0122993 (2002-09-01), Katakura
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0135099 (2002-09-01), Robinson et al.
patent: 2002/0142229 (2002-10-01), Resnick et al.
patent: 2002/0159918 (2002-10-01), Tseng et al.
patent: 2002/0167117 (2002-11-01), Chou
patent: 2002/0175298 (2002-11-01), Moniwa et al.
patent: 2002/0177319 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0062334 (2003-04-01), Lee et al.
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2003/0113638 (2003-06-01), Mancini et al.
patent: 2003/0180631 (2003-09-01), Shiota et al.
patent: 2003/0205657 (2003-11-01), Voisin
patent: 2004/0007799 (2004-01-01), Choi et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: 2004/0009673 (2004-01-01), Sreenivasan et al.
patent: 2004/0021254 (2004-02-01), Sreenivasan et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2004/0022888 (2004-02-01), Sreenivasan et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0053146 (2004-03-01), Sreenivasan et al.
patent: 2004/0110856 (2004-06-01), Young et al.
patent: 2004/0118809 (2004-06-01), Chou et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0131718 (2004-07-01), Chou et al.
patent: 2004/0137734 (2004-07-01), Chou et al.
patent: 2004/0150129 (2004-08-01), Hougham et al.
patent: 2004/0156108 (2004-08-01), Chou et al.
patent: 2004/0163563 (2004-08-01), Sreenivasan et al.
patent: 2004/0168586 (2004-09-01), Bailey et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0197843 (2004-10-01), Chou et al.
patent: 2004/0202865 (2004-10-01), Homola et al.
patent: 2004/0219246 (2004-11-01), Jeans
patent: 2004/0250945 (2004-12-01), Zheng et al.
patent: 2005/0037143 (2005-02-01), Chou et al.
patent: 2005/0051698 (2005-03-01), Sreenivasan et al.
patent: 2005/0064344 (2005-03-01), Bailey et al.
patent: 2005/0067379 (2005-03-01), Sreenivasan et al.
patent: 2005/0084804 (2005-04-01), Truskett et al.
patent: 2005/0098534 (2005-05-01), Sreenivasan et al.
patent: 2005/0100830 (2005-05-01), Xu et al.
patent: 2005/0158637 (2005-07-01), Kim et al.
patent: 2005/0184436 (2005-08-01), Jeong et al.
patent: 2005/0230882 (2005-10-01), Watts et al.
patent: 2006/0019183 (2006-01-01), Volsin
patent: 1460738 (2004-09-01), None
patent: 61-40845 (1986-02-01), None
patent: 1-196749 (1989-08-01), None
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: 02192045 (1990-07-01), None
patent: 2-248480 (1990-10-01), None
patent: 3-90345 (1991-04-01), None
patent: 9-278490 (1997-10-01), None
patent: WO 87/02935 (1987-05-01), None
patent: WO 99/05724 (1999-02-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
patent: WO 01/90816 (2001-11-01), None
patent: WO 02/07199 (2002-01-01), None
patent: WO 02/22916 (2002-03-01), None
patent: WO 03/010289 (2003-02-01), None
patent: WO 03/079416 (2003-09-01), None
patent: WO 03/099536 (2003-12-01), None
patent: WO 2004/114016 (2004-12-01), None
Yoneda et al., Translation of Japanese Patent 02-248480, Transparent Substrate with Water-Repellent and Antistaining Properties, and Structure Equipped Therewith Oct. 4, 1990.
Yoneda et al., Translation of Japanese Patent 02-248480, Transparent Substrate Material with Water-Repllent and Anti-Staining Properties and Structure Equipped with Same Oct. 4, 1990.
U.S. Appl. No. 11/298,244, naming Inventors Watts et al., entitled Method of Forming a Compliant Template for UV Imprinting, filed Dec. 9, 2005.
Feynman, There's Plenty of Room at the Bottom, Dec. 1, 1959.
Xia et al., Soft Lithography, Angew. Chem. Int. Ed., pp. 550-575 Jan. 1, 1998.
Krug et al., Fine Patterning of Thin Sol-gel Films, Journal of Non-Crystalline Solids 147 & 148, pp. 447-450 Jan. 1, 1992.
Nguyen, Asymmetric Fluid-Structure Dynamics in Nanoscale Imprint Lithography, The University of Texas at Austin, pp. 1-111 Aug. 1, 2001.
Abstract of Japanese Patent 02-92603, Aug. 12, 2004.
Abstract of Japanese Patent 02-24848, Jan. 26, 1990.
Sowah, Diamond used to Break the Mould, Retrieved Sep. 2, 2003 from URL: http://www.electronictimes.com/story/OEG20020918S0003 Sep. 18, 2002.
U.S. Appl. No. 10/827,118, naming Inventors Watts et al., entitled A Method of Forming a Deep-Featured Template Employed in Imprint Lithography, filed Apr. 19, 2004.
Abstract of Japanese Patent 61-040845, Feb. 27, 1986.
Abstract of Japanese Patent 02-248480, Oct. 4, 1990.
Abstract of Japanese Patent 3-090345, Apr. 16, 1991.
Abstract of Japanese Patent 09-278490, Oct. 28, 1997.
Abstract of Japanese Patent 61-040845, Feb. 27, 1986.
Abstract of Japanese Patent 02-248480, Oct. 4, 1990.
Gehoski et al., Indium Tin Oxide Template Development for Step and Flash Imprint Lithgraphy, SPIE Microlithography Conference Feb. 1, 2005.
Dauksher et al., Repair

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