Mixed mode photomask for nikon stepper

Details Mixed mode photomask for nikon stepper Mixed mode photomask for nikon stepper

1998-01-20

1999-09-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

059485728

ABSTRACT:
A mixed mode photo-mask for a stepper. Both alignment marks of 15 mm.times.15 mm and alignment marks of 20 mm.times.20 mm are tooled on the photo mask. The photo mask further comprises a reticle glass plate, a chrome border with a pattern to be transferred, and a pellicle.

REFERENCES:
patent: 5837404 (1998-11-01), Lu

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