Mixed-abrasive polishing composition and method for using...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C451S060000, C451S287000, C451S288000, C451S446000

Reexamination Certificate

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06896591

ABSTRACT:
The invention provides a polishing composition comprising (i) an abrasive comprising (a) about 5 to about 45 wt. % of first abrasive particles having a Mohs' hardness of about 8 or more, (b) about 1 to about 45 wt. % of second abrasive particles having a three-dimensional structure comprising aggregates of smaller primary particles, and (c) about 10 to about 90 wt. % of third abrasive particles comprising silica, and (ii) a liquid carrier. The invention also provides a method of polishing a substrate, which method comprises the steps of (i) providing the above-described polishing composition, (ii) providing a substrate having a surface, and (iii) abrading at least a portion of the substrate surface with the polishing composition to polish the substrate.

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patent: 5693239 (1997-12-01), Wang et al.
patent: 5942015 (1999-08-01), Culler et al.
patent: 6261476 (2001-07-01), Kwok et al.
patent: 6293848 (2001-09-01), Fang et al.
patent: 20020023389 (2002-02-01), Minamihaba et al.
patent: 0786504 (1997-07-01), None
patent: WO 9322103 (1993-11-01), None

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