Mist scrubbing of waste halide effluent

Details Mist scrubbing of waste halide effluent Mist scrubbing of waste halide effluent

1976-01-21

1977-06-14

Nozick, Bernard

Gas separation

Means within gas stream for conducting concentrate to collector

55 72, B01D 5300

Patent

active

040294846

ABSTRACT:
A process for cleansing waste halides from a waste gas stream containing waste halide impurities wherein the waste gas stream is contacted with an aqueous acid mist selected from HCl, HNO.sub.3, HBr, HF, and HI, or an aqueous halide salt mist selected from halide salts of calcium, sodium, ammonium, lithium, barium, and iron, with the provisos that the temperature of the combined gas stream and aqueous mist is about -5.degree. to 70.degree. C., the water vapor pressure of the aqueous mist is about 0.05-5.0 mm Hg, and the ratio of surface area of the aqueous mist to the weight of waste halide is at least 2 square meters surface area of aqueous mist per gram of waste halide. Then the gas stream is separated from the acid and the gas stream is scrubbed with water.

REFERENCES:
patent: 3460900 (1969-08-01), Moldovan et al.
patent: 3505788 (1970-04-01), Teller et al.
patent: 3564817 (1971-02-01), Kleinfelder et al.
patent: 3690041 (1972-09-01), Low
patent: 3755990 (1973-09-01), Hardison

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