Misregistration detecting marks for pattern formed on semiconduc

Details Misregistration detecting marks for pattern formed on semiconduc Misregistration detecting marks for pattern formed on semiconduc

1996-12-17

1998-02-24

Font, Frank G.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 430 22, G01B 1100

Patent

active

057216193

ABSTRACT:
A semiconductor device according to the present invention has misregistration detecting marks provided in the periphery of a semiconductor chip. The misregistration detecting marks consist of a first scale mark for detecting misalignment in a first direction, a second scale mark for detecting misalignment in a second direction perpendicular to the first direction, and a third scale mark for detecting misalignment in a third direction making respectively specified angles with the first direction and the second direction.

REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4669866 (1987-06-01), Phillips
patent: 5407763 (1995-04-01), Pai
patent: 5528372 (1996-06-01), Kawashima
patent: 5596413 (1997-01-01), Stanton et al.

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