MIS type semiconductor integrated circuit device having a refrac

Fishing – trapping – and vermin destroying

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357 231, 357 59, 357 67, 437200, H01L 2701, H01L 2904, H01L 2348, H01L 2946

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active

050033751

ABSTRACT:
An MIS type semiconductor integrated circuit device, composed of: a semiconductor substrate of a first conductivity type provided with spaced source and drain regions of a second conductivity type; a gate insulated film formed on the semiconductor substrate; a film of polycrystalline silicon formed on the gate insulation film; a gate electrode composed of a film of a refractory metal formed on the polycrystalline silicon film; and a film of a refractory metal silicide formed on the exposed surfaces of the gate electrode; wherein the source and drain regions are formed in the semiconductor substrate on both sides of the gate electrode on which the refractory metal silicide film is formed.

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S. M., Sze, Semiconductor Devices, Physics and Technology, John Wiley & Sons (1985), p. 382.

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