MIS structure photosensor

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Details

357 30, H01L 4500, H01L 2714, H01L 3100

Patent

active

050499505

ABSTRACT:
A MIS structure is provided which uses a photoconductive amorphous silicon carbide layer as an insulator layer in the MIS structure. The insulator layer is disposed on an n-type layer of single crystal silicon carbide and a translucent metal layer is disposed thereon. The metal layer is biased with a negative voltage so that the capacitance between the metal layer and the semiconductor layer changes in response to whether on the metal layer is illuminated with light.

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patent: 4681984 (1987-07-01), Moeller
patent: 4849797 (1989-07-01), Ukai
"Metal-Oxide-Semiconductor Characteristics of Chemical Vapor Deposited SiC", Japanese J. of Appl. Physics, Nov. 1984, pp. 862-864 (Shibahara et al).
Hayashi, "Switching Phenomena in Thin-Insulator Metal-Insulator-Semiconductor Diodes", Appl. Phys. Lttr., 37(4), 1980.
Green et al., "High Efficiency . . . Min MIS Solar Cells", 14th IEEE Photovoltaic Specialists Conf., 1980, in San Diego, Calif.
Sze, Semiconductorl Devices, 1985.
"Metal-Oxide-Semiconductor Characterisitcs of Chemical Vapor Deposited Cubic-SIC", Japanese Jounral of Applied Physics, Nov. 1984, pp. 862-864.

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