MIS electrode forming process

Details MIS electrode forming process MIS electrode forming process

1991-07-30

1995-02-28

Wilczewski, Mary

Fishing, trapping, and vermin destroying

437184, 437235, 437241, 437946, H01L 21285, H01L 21336, H01L 21306

Patent

active

053936809

ABSTRACT:
There is disclosed a process for forming a MIS electrode by forming an insulation film on a substrate of a III-V compound semiconductor, and applying an electrode material thereto, a surface of the substrate being treated with a phosphoric acid-based etchant and selenium or sulfur-passivated, and then an insulation film being formed.

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