Optical: systems and elements – Mirror – Including specified control or retention of the shape of a...
Reexamination Certificate
2007-11-12
2009-12-08
Amari, Alessandro (Department: 2872)
Optical: systems and elements
Mirror
Including specified control or retention of the shape of a...
C359S883000, C378S034000, C355S053000
Reexamination Certificate
active
07628497
ABSTRACT:
Disclosed are a mirror unit and a method of producing the same. In one preferred embodiment, the mirror unit includes a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred embodiment includes forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and partially removing the multilayered film.
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Masaki Yamamoto, “Sub-nm figure error correction of an extreme ultraviolet multilayer mirror by its surface milling”, Nuclear Instruments & Methods in Physics Research, Section A, 467-468 (2001), 1282-1285.
U. Dinger, et al., “Mirror substrates for EUV-lithography: progress in metrology and optical fabrication technology”, Carl Zeiss (Germany), Proceedings of SPIE, vol. 4146 (2000), 35-46.
Miyake Akiri
Yamamoto Takeshi
Amari Alessandro
Canon Kabushiki Kaisha
Rossi Kimms & McDowell LLP
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