Mirror element for the reflection of x-rays

Details Mirror element for the reflection of x-rays Mirror element for the reflection of x-rays

2005-07-19

2005-07-19

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S034000

Reexamination Certificate

active

06920199

ABSTRACT:
A mirror element for the reflection of x-rays, particularly for EUVL exposure systems for the manufacture of semiconductor structures, wherein the x-rays reach the mirrors under a certain incident angle, consists of a substrate with a multilayer structure disposed thereon which multilayer structure comprises at least a first layer of a lanthanum-containing compound and a second layer of a boron-containing compound alternately disposed on the substrate.

REFERENCES:
patent: 5939201 (1999-08-01), Boire et al.
patent: 6278764 (2001-08-01), Barbee et al.
patent: 6331710 (2001-12-01), Wang et al.
patent: 6449086 (2002-09-01), Singh
patent: 6643353 (2003-11-01), Verman et al.
patent: 6763086 (2004-07-01), Platonov
patent: WO 0075646 (2000-12-01), None

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