Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-01-23
2007-01-23
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S240000, C438S254000, C257SE31131
Reexamination Certificate
active
11062201
ABSTRACT:
A miniaturized imaging device and method of viewing small luminal cavities are described. The imaging device can be used as part of a catheter, and can include a lens, an SSID including an imaging array optically coupled to the lens; an umbilical including a conductive line; and an adaptor configured to support the lens and provide electrical communication between the SSID and conductive line. Alternatively, the adaptor can be a rigid adaptor configured to provide electrical communication between the SSID and the conductive line through a conductive path. The conductive path can be configured along multiple contiguous surfaces of the adaptor such that the SSID is electrically coupled to the conductive path at a first surface, and the conductive line is electrically coupled to the conductive path at a second surface.
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Jacobsen Stephen C.
Marceau David P.
Markus David T.
Pensel Ralph W.
Lebentritt Michael
Sarcos Investments LC
Thorpe North & Western LLP
Ullah Elias
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