Mini clean room for preventing wafer pollution and using...

Details Mini clean room for preventing wafer pollution and using... Mini clean room for preventing wafer pollution and using...

2008-11-12

2011-12-27

Lowe, Scott (Department: 3652)

Material or article handling

Process

Of moving material between zones having different pressures...

C414S217000, C414S222020, C414S222120, C414S806000, C414S939000

Reexamination Certificate

active

08083463

ABSTRACT:
A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.

REFERENCES:
patent: 7874781 (2011-01-01), Nozawa et al.
patent: 2005/0053456 (2005-03-01), Ackeret et al.
patent: 2005/0238464 (2005-10-01), Matsuoka et al.
patent: 2006/0182529 (2006-08-01), Hiroki

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