Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area
Patent
1990-04-02
1993-08-17
Mintel, William
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating selected area
205189, 205190, 359 58, G11B 566, G02F 113
Patent
active
052365735
ABSTRACT:
A MIM device is fabricated by depositing sequentially on a substrate (14) a first conductive layer (30), a thin layer of insulative material (32) of for example silicon oxynitride or silicon nitride. The first conductive layer is formed of anodisable material, e.g. tantalum, and following deposition of the insulative layer the structure is subjected to an anodisation process whereby anodic material (41,35), is grown at any pin holes (40) or weak regions in the insulative layer so as to repair such defects. A second conductive layer (34) is then formed. An array of MIM devices formed in this manner can be used in an active matrix addressed LCD panel.
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Ho Tan
Mintel William
Spain Norman N.
U.S. Philips Corporation
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