Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-09-27
2005-09-27
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298370, C156S345300, C156S345370, C156S345190
Reexamination Certificate
active
06949174
ABSTRACT:
A milling apparatus is provided in which temperature rise of a treatment-object in milling treatment, especially of the substrate thereof, is prevented. In the apparatus, ionization mechanism2comprises casing20dhaving an opening at the center portion of the face thereof opposing to substrate5held by substrate holder6;a filament is placed at the position where the straight line drawn from the filament to substrate5is intercepted by casing20d;and electromagnets31, 32are provided around ionization mechanism2for generating a magnetic field to produce magnetic lines extending through opening20jto substrate5.
REFERENCES:
patent: 5038713 (1991-08-01), Kawakami et al.
patent: 5266146 (1993-11-01), Ohno et al.
patent: 6554974 (2003-04-01), Shiratori
patent: 6624081 (2003-09-01), Dykstra et al.
patent: 1-301870 (1989-12-01), None
patent: 2001-167479 (2001-06-01), None
Kanai Masahiro
Koike Atsushi
Oya Katsunori
Yamaguchi Hirohito
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