Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-09-06
1990-09-25
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
423446, C23C 1650
Patent
active
049585908
ABSTRACT:
A microwave traveling-wave production element produces diamond using a chemical vapor deposition (CVD) process. The production element includes a waveguide of a specified length and cross section designed to operate in a specified microwave transmission mode. A microwave oscillator mounted at one end of the waveguide provides microwave energy to the waveguide at a specified frequency for operating in the desired transmission mode. A matched termination load mounted at the other end of the waveguide absorbs the microwave energy that travels through the waveguide and prevents standing waves from being developed within the waveguide. One or more substrate plates are positioned within the waveguide so as to follow a contour of approximately constant tranverse electric field strength. A gaseous mixture, having a composition that promotes the deposition of diamond on the substrate plates, is maintained proximate the substrate plates at a specified pressure. The energy of the microwaves traveling through the waveguide creates plasma having a uniform temperature near the region of the substrate plates and further heats the gaseous mixture and substrate plates sufficiently to promote the CVD deposition of diamond on the surface of the substrate plates. Several production elements may be combined in a production system to significantly increase the number of substrate plates used, and hence the yield of the diamond.
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Bueker Richard
General Atomics
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