Microwave plasma source

Details Microwave plasma source Microwave plasma source

2006-04-18

2006-04-18

Evans, F. L. (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

C219S121480

Reexamination Certificate

active

07030979

ABSTRACT:
A plasma source for a spectrometer includes a plasma torch (10) located within a waveguide or resonant cavity (40) for both the electric and the magnetic field components of a microwave electromagnetic field to excite a plasma (54). This produces a plasma (54) having a generally elliptical cross section into which sample is relatively easily injected but which still provides good thermal coupling between the plasma and the sample. The invention gives significantly improved limits of detection compared to prior art microwave induced plasma systems. The torch is preferably axially aligned with the direction of the magnetic field component and may be located within a resonant iris (32) within the waveguide or cavity (40).

REFERENCES:
patent: 4933650 (1990-06-01), Okamoto
patent: 5051557 (1991-09-01), Satzger
patent: 5235401 (1993-08-01), Cilia et al.
patent: 5302803 (1994-04-01), Stevens et al.
patent: WO 02/04930 (2002-01-01), None

Affiliated with

Also associated with

Rating

Microwave plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microwave plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3584128