Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1995-05-18
1996-05-28
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
216 69, B44C 122, C03C 1500, C03C 2506
Patent
active
055207715
ABSTRACT:
The present invention relates to a microwave plasma processing method and apparatus. More particularly, it relates to a microwave plasma processing method and apparatus of the type wherein a waveguide section includes electric discharge means isolated from a waveguide for the propagation of microwaves and having a plasma generation region therein, which method and apparatus are well suited for subjecting samples, such as semiconductor device substrates, to an etching process, a film forming process, etc.
According to the present invention, the microwaves are introduced into the electric discharge means in correspondence with only the traveling direction thereof, whereby uniformity in a plasma density distribution corresponding to the surface to-be-processed of the sample can be sharply enhanced, so that the sample processed by utilizing such plasma can attain an enhanced processing homogeneity within the surface to-be-processed.
REFERENCES:
patent: 5034086 (1991-07-01), Sato
patent: 5364519 (1994-11-01), Fujimura et al.
Ichihashi Kazuaki
Kanai Saburo
Kawasaki Yoshinao
Nawata Makoto
Watanabe Seiichi
Hitachi , Ltd.
Powell William
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