Electric heating – Metal heating – By arc
Reexamination Certificate
2005-07-07
2011-10-11
Paschall, Mark (Department: 3742)
Electric heating
Metal heating
By arc
C219S121520, C219S121500
Reexamination Certificate
active
08035057
ABSTRACT:
Systems and methods for generating microwave plasma are disclosed. The present invention provides a microwave plasma nozzle (26) that includes a gas flow tube (40), and a rod-shaped conductor (34) that is disposed in the gas flow tube (40) and has a tip (33) near the outlet of the gas flow tube (40). A portion (35) of the rod-shaped conductor (34) extends into a microwave cavity (24) to receive microwaves passing in the cavity (24). These received microwaves are focused at the tip (33) to heat the gas into plasma. The microwave plasma nozzle (26) also includes a vortex guide (36) between the rod-shaped conductor (34) and the gas flow tube (40) imparting a helical shaped flow direction to the gas flowing through the tube (40). The microwave plasma nozzle (26) further includes a shielding mechanism (108) for reducing a microwave power loss through the gas flow tube (40).
REFERENCES:
patent: 3911318 (1975-10-01), Spero et al.
patent: 4151034 (1979-04-01), Yamamoto et al.
patent: 4185213 (1980-01-01), Scannell
patent: 4609808 (1986-09-01), Bloyet et al.
patent: 4611108 (1986-09-01), Leprince et al.
patent: 4652723 (1987-03-01), Salinier et al.
patent: 4711627 (1987-12-01), Oeschsle et al.
patent: 5083004 (1992-01-01), Wells et al.
patent: 5114770 (1992-05-01), Echizen et al.
patent: 5349154 (1994-09-01), Harker et al.
patent: 5565118 (1996-10-01), Asquith
patent: 5645796 (1997-07-01), Caputo et al.
patent: 5679167 (1997-10-01), Muehlberger
patent: 5689949 (1997-11-01), DeFreitas et al.
patent: 5793013 (1998-08-01), Read et al.
patent: 5972302 (1999-10-01), Tranquilla et al.
patent: 5994663 (1999-11-01), Lu
patent: 6039834 (2000-03-01), Tanaka et al.
patent: 6125859 (2000-10-01), Kao et al.
patent: 6157867 (2000-12-01), Hwang et al.
patent: 6230652 (2001-05-01), Tanaka et al.
patent: 6262386 (2001-07-01), Foernsel
patent: 6388225 (2002-05-01), Bluem et al.
patent: 6417013 (2002-07-01), Teixeira et al.
patent: 6525481 (2003-02-01), Kilma et al.
patent: 6673200 (2004-01-01), Gu et al.
patent: 6734385 (2004-05-01), Bark et al.
patent: 7164095 (2007-01-01), Lee et al.
patent: 7338575 (2008-03-01), Pingree, Jr. et al.
patent: 7554054 (2009-06-01), Takada et al.
patent: 2001/0024114 (2001-09-01), Kitagawa et al.
patent: 2002/0020691 (2002-02-01), Jewett et al.
patent: 2002/0050323 (2002-05-01), Moisan et al.
patent: 2003/0000823 (2003-01-01), Uhm et al.
patent: 2003/0032207 (2003-02-01), Rengarajan et al.
patent: 2003/0085000 (2003-05-01), Horioka et al.
patent: 2003/0178140 (2003-09-01), Hamazaki et al.
patent: 2003/0199108 (2003-10-01), Tanaka et al.
patent: 2004/0007326 (2004-01-01), Roche et al.
patent: 2004/0016402 (2004-01-01), Walther et al.
patent: 2004/0079287 (2004-04-01), Smith et al.
patent: 2004/0083797 (2004-05-01), Ward et al.
patent: 2004/0173583 (2004-09-01), Iriyama et al.
patent: 2004/0262268 (2004-12-01), Wu
patent: 2006/0006153 (2006-01-01), Lee et al.
patent: 2006/0021581 (2006-02-01), Lee et al.
patent: 2006/0021980 (2006-02-01), Lee et al.
patent: 2006/0042546 (2006-03-01), Ishii et al.
patent: 2006/0057016 (2006-03-01), Kumar et al.
patent: 2007/0221634 (2007-09-01), Condick
patent: 2008/0017616 (2008-01-01), Lee et al.
patent: 2008/0029030 (2008-02-01), Goto et al.
patent: 2008/0073202 (2008-03-01), Lee et al.
patent: 2008/0093358 (2008-04-01), Lee et al.
patent: 2010/0201272 (2010-08-01), Lee
patent: 2704179 (2005-06-01), None
patent: 101137267 (2008-03-01), None
patent: 0 397 468 (1990-11-01), None
patent: 60-046029 (1985-03-01), None
patent: 60-502243 (1985-12-01), None
patent: 62-81274 (1987-04-01), None
patent: 62-228482 (1987-10-01), None
patent: EP-0 397 468 (1990-11-01), None
patent: 3-075318 (1991-03-01), None
patent: 5-146879 (1993-06-01), None
patent: 6-013329 (1994-01-01), None
patent: 6-244140 (1994-09-01), None
patent: 7-135196 (1995-05-01), None
patent: 7-258828 (1995-10-01), None
patent: 9-169595 (1997-06-01), None
patent: 10-284296 (1998-10-01), None
patent: 2001-044177 (2001-02-01), None
patent: 2001-502110 (2001-02-01), None
patent: 2001-068298 (2001-03-01), None
patent: 2002-124398 (2002-04-01), None
patent: 2003-033862 (2003-02-01), None
patent: 2003-059917 (2003-02-01), None
patent: 2003-086580 (2003-03-01), None
patent: 2003-133302 (2003-05-01), None
patent: 2003-167017 (2003-06-01), None
patent: 2003-171785 (2003-06-01), None
patent: 2003-197397 (2003-07-01), None
patent: 2003-213414 (2003-07-01), None
patent: 2004-006211 (2004-01-01), None
patent: 2004-237321 (2004-08-01), None
patent: 2004-285187 (2004-10-01), None
patent: 2005-002355 (2005-01-01), None
patent: 2005-095744 (2005-04-01), None
patent: 2005-116217 (2005-04-01), None
patent: 2005-235464 (2005-09-01), None
patent: 2005-534187 (2005-11-01), None
patent: 2006-121073 (2006-05-01), None
patent: 2007-530955 (2007-11-01), None
patent: 2008-508683 (2008-03-01), None
patent: 2006-000194 (2006-01-01), None
patent: WO-2004-017046 (2004-01-01), None
patent: WO-2005/096681 (2005-10-01), None
patent: WO-2006/014862 (2006-02-01), None
U.S. Appl. No. 11/631,723, filed Jan. 4, 2007, Lee et al.
U.S. Appl. No. 11/661,048, filed Feb. 22, 2007, Lee et al.
U.S. Appl. No. 11/661,067, filed Feb. 22, 2007, Lee et al.
U.S. Appl. No. 12/284,570, filed Sep. 23, 2008, Lee.
U.S. Appl. No. 12/291,646, filed Nov. 12, 2008, Lee.
U.S. Appl. No. 12/315,913, filed Dec. 8, 2008, Lee.
U.S. Appl. No. 12/322,909, filed Feb. 9, 2009, Lee.
U.S. Appl. No. 12/380,835, filed Mar. 4, 2009, Lee.
U.S. Appl. No. 12/384,536, filed Apr. 6, 2009, Lee et al.
U.S. Appl. No. 12/386,578, filed Apr. 21, 2009, Lee et al.
Kim Jay Joongsoo
Lee Sang Hun
Amarante Technologies, Inc.
Jordan and Hamburg LLP
Paschall Mark
Saian Corporation
LandOfFree
Microwave plasma nozzle with enhanced plume stability and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave plasma nozzle with enhanced plume stability and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave plasma nozzle with enhanced plume stability and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4261365