Microwave plasma ion source

Radiant energy – Ion generation – Field ionization type

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Details

313156, 3133631, H01J 2700

Patent

active

043160905

ABSTRACT:
A microwave plasma ion source according to this invention is characterized by the construction of the extracting electrode in contact with the discharge chamber. The electrode is divided into a part substantially exposed to a plasma and a remaining part which is not exposed to the plasma. Moreover, both these parts are held in a state in which they are electrically connected with each other.
As a result, very little P or As deposits on the surface of the electrode, and a stable high-current ion beam can be supplied over a long period of time.

REFERENCES:
patent: 3137801 (1964-06-01), Brooks et al.
patent: 3552124 (1971-01-01), Banks et al.
patent: 4058748 (1977-11-01), Sakudo et al.

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