Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1980-12-10
1983-07-12
Chatmon, Jr., Saxfield
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
315 39, 31511141, 3133631, 313364, 250396ML, 250423F, H01J 724, H05B 3126
Patent
active
043933335
ABSTRACT:
A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.
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patent: 4287419 (1981-09-01), Booth
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patent: 4303865 (1981-12-01), Swingle
Kanomata Ichiro
Koike Hidemi
Nakashima Humihiko
Sakudo Noriyuki
Tokiguchi Katsumi
Chatmon, Jr. Saxfield
Hitachi , Ltd.
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