Microwave plasma ion source

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source

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315 39, 31511141, 3133631, 313364, 250396ML, 250423F, H01J 724, H05B 3126

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active

043933335

ABSTRACT:
A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.

REFERENCES:
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patent: 3212974 (1965-10-01), Leboutet et al.
patent: 3375452 (1968-03-01), Forsyth
patent: 3390293 (1968-06-01), Nunan
patent: 3778656 (1973-12-01), Fremiot et al.
patent: 4287419 (1981-09-01), Booth
patent: 4293794 (1981-10-01), Kapetanakos et al.
patent: 4303865 (1981-12-01), Swingle

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