Microwave plasma etching apparatus having fan-shaped discharge

Details Microwave plasma etching apparatus having fan-shaped discharge Microwave plasma etching apparatus having fan-shaped discharge

1980-04-07

1984-02-07

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118720, 118730, 156643, 204192E, 204298, C23F 102

Patent

active

044301383

ABSTRACT:
In a microwave plasma etching apparatus wherein the surface of a sample is exposed to a plasma generated by microwave discharge, thereby to subject the sample surface to an etching processing; the sample is transported while revolving along a circular orbit in a plasma exposure region, and the section of the plasma exposure region is put into the shape of a fan whose pivot coincides with the central point of the circuit orbit, whereby the enhancement of the etching processing capability and the uniformity of the etching speed are achieved.

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Horike et al., "A Dry Etching . . . Microwave", Electrochemical Society-Semiconductor Silicon, p. 1071ff (5/77).
Suzuki et al., "Microwave . . . Etching", Japanese J. of Applied Physics, vol. 16, No. 11 (11/77) pp. 1979-1984.

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