Microwave plasma CVD apparatus provided with a microwave transmi

Details Microwave plasma CVD apparatus provided with a microwave transmi Microwave plasma CVD apparatus provided with a microwave transmi

1993-05-19

1994-11-01

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723ME, 333 99PL, C23C 1650

Patent

active

053604849

ABSTRACT:
An improved microwave plasma CVD apparatus for forming a functional deposited film which is provided with a microwave transmissive window composed of a sintered alpha-alumina ceramics body containing alpha-alumina as a matrix comprised of fine particles with a mean particle size d satisfying the equation 0.5 .mu.m.ltoreq.d.ltoreq.50 .mu.m and with a ratio of .rho..sub.2 /.rho..sub.1 between the theoretical density .rho..sub.1 and the bulk density .rho..sub.2 satisfying the equation 0.800.ltoreq..rho..sub.2 /.rho..sub.1 .ltoreq.0.995.

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