Microwave plasma CVD apparatus

Details Microwave plasma CVD apparatus Microwave plasma CVD apparatus

1991-03-19

1993-01-12

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

156345, C23C 1648, C23C 1650

Patent

active

051786834

ABSTRACT:
A microwave CVD apparatus comprises a rectangular applicator with microwave inlets, a bell jar with an inlet and an outlet for reaction gas arranged in the applicator, and a sample-receiving table. Reaction gas is introduced into the bell jar and plasma of the reaction gas is generated therein. At least one of walls of the applicator is movable so as to change distribution of plasma intensity continuously, so that material is uniformly deposited on the whole surface of the sample.

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