Microwave plasma assisted supersonic gas jet deposition of thin

Details Microwave plasma assisted supersonic gas jet deposition of thin Microwave plasma assisted supersonic gas jet deposition of thin

1992-01-07

1993-10-26

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

With treating means

118718, 118725, 118729, 118730, 31511121, C23C 1650, C23C 1654

Patent

active

052562050

ABSTRACT:
An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.

REFERENCES:
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patent: 4909914 (1990-03-01), Chiba et al.
patent: 4911805 (1990-03-01), Ando et al.
patent: 4957061 (1990-09-01), Ando et al.
patent: 4982067 (1991-01-01), Marantz et al.
patent: 5104634 (1992-04-01), Cakote
Matsumoto et al., "Synthesis of Diamond films in a rf induction thermal plasma", Appl. Phys. Lett., Sep. 1987, pp. 737-739.

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