Microwave plasma apparatus for generating a uniform plasma

Details Microwave plasma apparatus for generating a uniform plasma Microwave plasma apparatus for generating a uniform plasma

1991-10-17

1994-10-25

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912152, 156345, 20429838, B23K 900, H05H 146

Patent

active

053591771

ABSTRACT:
A microwave plasma apparatus comprises a discharge chamber for generating a plasma. A dielectric plate is placed on a surface of the discharge chamber. A microwave circuit surrounds the longitudinal side surface of the dielectric plate and the microwave circuit is adapted to couple the signal propagating therein to the dielectric plate, whereby a microwave electric field is formed within the discharge chamber to generate a plasma therein. The microwave circuit may comprise a rectangular waveguide, and a part of a wall surface of the rectangular waveguide is utilized as a terminal portion.

REFERENCES:
patent: 4543465 (1985-09-01), Sakudo et al.
patent: 4987284 (1991-01-01), Tujimura et al.
patent: 5061838 (1991-10-01), Lane et al.

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